Atomistic origins of material removal rate anisotropy in mechanical polishing of diamond crystal
摘要：
In this work, molecular dynamics simulation is employed to represent the diamond polishing. Radial distribution function and coordination number analyses are further performed to reveal the underlying atomistic origins of the removal rate anisotropy. The results show that the lattice distortion is inevitable as the diamond substrate suffers from the mechanically induced effects, which produces an amorphous layer on the surface. In the amorphization, the perfect diamond cubic transforms to some non-diamond phases, including the amorphous sp
会员登录
